Semiconductor

Semiconductor manufacturing demands materials that can perform reliably in some of the most aggressive and tightly controlled process environments in the world

Fluorocarbon supplies high-performance fluoropolymers, engineering plastics, precision-machined components, and surface coatings to semiconductor equipment OEMs and subsystem suppliers worldwide. Our materials are engineered to meet the chemical resistance, dimensional stability, and cleanliness requirements of both front-end wafer fabrication and back-end packaging processes.

Key capabilities include:

  • High-performance materials for vacuum, plasma, cryogenic, and chemical process environments
  • Precision-machined components and surface coatings for critical semiconductor applications
  • Low outgassing and particle-controlled material solutions
  • Support from prototype development through to production volumes
  • Full batch traceability and documentation as standard
microchip futuristic view - PCTFE in the semiconductor industry

Operating Environments & Engineering Challenges

Semiconductor manufacturing environments place extreme demands on materials, where performance directly impacts yield, uptime, and process stability. Materials must operate reliably across a combination of vacuum conditions, aggressive chemistries, temperature extremes, and precision-driven processes, often simultaneously.

Semiconductor Applications

Operating Environments & Engineering Challenges

Wet processes involve direct exposure to aggressive chemicals such as HF, HCl, and HSO require materials that are chemically inert, non-leaching, and capable of maintaining ultra-high purity. Contamination or material degradation in these systems can directly impact wafer cleanliness & yield.

Recommended Materials:

  • PTFE / PFA / FEP → Chemically inert materials for direct contact with aggressive acids, offering zero ionic leaching and long-term durability in wet processing environments
  • PFA → Preferred for high-purity fluid handling systems requiring weldability, low permeability, and fabrication into complex geometries
  • PVDF → Provides higher mechanical rigidity while maintaining strong chemical resistance for semi-structural components
  • PEEK → High mechanical strength and dimensional stability for CMP retaining rings and slurry-exposed, load-bearing components
  • PCTFE → Ultra-low moisture absorption and gas permeability for critical chemical delivery systems where contamination control is essential

Typical Components We Supply For This Environment:

  • Wet cleaning systems: fluid-contact components in chemically inert fluoropolymers, wetted fittings, drain line components, and handling components engineered for HF, HCl, and concentrated acid bath environments.
  • Wet etching system components: chemical-resistant fluid-contact components including spray and dispensing components, valve bodies, fittings, and bench components for buffered chemistries.
  • Chemical delivery and fluid handling: fluid-contact fittings and connectors, chemical dispensing components, point-of-use filter housings, and transfer components for solvent-based and aggressive chemistries.
  • CMP slurry systems: slurry delivery and handling components in abrasion-resistant fluoropolymers and engineering plastics; pump-side wetted components; filter bodies; and precision-machined retaining components for wafer polishing heads where wear resistance, dimensional stability, and chemical inertness under combined load are critical.

 

Case Study: Precision Components for Semiconductor Wafer Carrier Trays

A leading wet processing systems manufacturer required clip assemblies and support rods for wafer carrier trays operating in aggressive acids at elevated temperatures under continuous mechanical stress.

Fluorocarbon engineered the components using Fluorinoid® FL200 and Fluorinoid® FL305 to tight tolerances to minimise wafer movement and yield risk.

The result was reduced component wear, extended carrier service life, and a long-term supply partnership.

Operating Environments & Engineering Challenges

Dry processes involve plasma exposure, reactive gases, and elevated temperatures. Materials must resist plasma erosion, minimise particle generation, and maintain performance under vacuum and thermal stress.

Recommended Materials:

  • PEEK → High mechanical strength and dimensional stability for plasma-exposed structural components, with strong resistance to ionic bombardment
  • PI (Polyimide) / PAI (Polyamide-imide) → Exceptional thermal stability and electrical insulation for the highest temperature plasma environments
  • PPS → Good chemical resistance and thermal stability for components in less severe plasma exposure zones
  • PFA / PTFE → Chemically inert, high-purity materials for precursor gas delivery in CVD and ALD, resistant to halogen-based chemistries
  • PEI → Structural and insulating material for components near plasma zones, where temperatures and exposure are moderate
  • PCTFE → Ultra-low gas permeability for critical precursor delivery lines where contamination control is essential

Typical Components We Supply For This Environment:

  • Plasma chamber liners: chamber liners, shields, and focus rings in plasma-resistant engineering plastics; fasteners and fixtures engineered to minimise particle generation under sustained plasma exposure.
  • Chamber sealing & insulation: seal and insulator components for process chambers and load lock interfaces; beamline components in high-temperature, low-outgassing materials.
  • Electrical insulators & standoffs: dielectric spacers, standoffs, and insulating components for high-temperature reactor environments, specified for vacuum compatibility and low outgassing.

 

Operating Environments & Engineering Challenges

Lithography processes require extreme precision, thermal stability, and contamination control. Materials must maintain dimensional accuracy while avoiding outgassing and particle generation under UV exposure and elevated temperatures.

Recommended Materials:

  • PTFE / PFA → Chemically inert materials for photoresist and developer handling systems, preventing solvent attack and eliminating ionic contamination
  • PEEK → High stiffness and dimensional stability for structural and handling components in lithography tools operating under vacuum and UV exposure
  • PPS → Good thermal stability and low outgassing for secondary structural components in controlled lithography environments
  • PI (Polyimide) → Low outgassing and excellent thermal stability for components exposed to vacuum and UV conditions
  • PAI (Polyamide-imide) → Superior stiffness, dimensional stability, and low outgassing for precision alignment and structural components where elevated temperatures exceed PEEK capabilities

Typical Components We Supply For This Environment:

  • Wafer handling and transport components: end-effectors and edge-contact components in dimensionally stable engineering plastics; cassette and FOUP-interface components.
  • Precision alignment components: tight-tolerance structural components where dimensional accuracy must be maintained through thermal cycling; support structures and kinematic mounts for optical and metrology assemblies.
  • Vacuum wafer chucks: precision-machined chuck components for wafer clamping in exposure and metrology tools; components requiring low outgassing and high dimensional stability under vacuum load.
  • Mask and reticle handling components: non-contaminating contact components for pellicle and mask interfaces; dispense and delivery components for photoresist and developer chemistries.

Case Study: Particle-controlled Coatings for Semiconductor Wafer Contact Applications

A European automation specialist required a PTFE coating for aluminium components in direct contact with semiconductor wafers. Low friction was needed, but the defining requirement was particle control. Any particle above 10 microns on the coated surface was unacceptable.

Fluorocarbon treated this as a process engineering problem, not a coating selection exercise. Coating chemistry, application method, cure cycle, substrate condition, and post-coating handling were all evaluated together to produce a surface safe for direct wafer contact with validation steps built in before scaling to production.

Operating Environments & Engineering Challenges

Gas delivery systems operate under high purity and vacuum conditions, often with reactive or corrosive gases. Materials must prevent contamination while maintaining mechanical and chemical integrity.

Recommended Materials:

  • PTFE / PFA → Chemically inert, ultra-clean materials for gas delivery systems, offering near-zero reactivity and low permeability for high-purity process gases
  • PFA → Preferred for ultra-high-purity gas lines requiring enhanced permeability resistance and weldable fabrication
  • Spring-energised PTFE seals → Low outgassing, chemically inert sealing solutions for semiconductor vacuum applications, maintaining performance through thermal cycling
  • PCTFE → Ultra-low gas permeability and moisture absorption for critical applications in cryogenic and ultra-high-vacuum environments

Typical Components We Supply For This Environment:

  • Vacuum sealing solutions: spring-energised PTFE seals for process chamber doors, load locks, and valve seats; static face seals for flanged vacuum connections; custom seal profiles machined to drawings for tool-specific geometries; and ultra-low-permeability sealing components for cryogenic and UHV applications.
  • Gas delivery components: fittings, connectors, and line components for ultra-high-purity process gas delivery; precursor delivery components for CVD and ALD; chemical delivery components from bulk supply to point of use.
  • Load lock system components: door seals and interface components for load lock chambers; vacuum-compatible structural components in low-outgassing grades; transition components between atmospheric and process vacuum environments.

Case Study: Flanged Spring-energised PTFE Rotary Seal for Semiconductor Load Cleaner Application

A UK-based semiconductor manufacturer needed a custom replacement for a spring-energised PTFE rotary seal operating in continuous contact with deionised water.

The original carbon and graphite-filled PTFE specification carried an unacceptable risk of ionic leaching into the ultra-pure DI water stream.Non-standard geometry precluded any catalogue solution.

Fluorocarbon evaluated the operating conditions and hardware constraints before recommending a custom fibreglass-filled PTFE seal, delivering DI water compatibility, rotary wear resistance, and precise dimensional conformance for direct integration without hardware modification.

Operating Environments & Engineering Challenges

Back-end processes combine mechanical handling, thermal cycling, and chemical exposure. Materials must offer dimensional stability, wear resistance, and contamination control across high-volume production environments.

Recommended Materials:

  • PEEK → High mechanical strength and dimensional stability for structural and handling components in BEOL equipment operating at elevated temperatures
  • PPS → Thermally stable, chemically resistant material for tooling and handling components across semiconductor back-end processes
  • PTFE / PFA → Chemically inert, non-stick materials for adhesive delivery systems, coolant lines, and low-friction surface applications
  • PI (Polyimide) / PAI (Polyamide-imide) → High-temperature materials with excellent electrical insulation and stability under thermal cycling for extreme BEOL conditions
  • PEI → Structural insulating material for test sockets, burn-in carriers, and handling components, offering dimensional stability up to ~170°C
  • Static dissipative PEI → ESD-safe variant for test and handling equipment requiring controlled electrostatic discharge alongside mechanical precision

Typical Components We Supply For This Environment:

  • Dicing and cutting system components: chuck tables, mounting fixtures, and blade-side components in dimensionally stable engineering plastics; cooling and fluid delivery components resistant to silicon particle exposure and surfactant-containing coolants.

  • Handling and transport components: wafer and die handling trays and carriers in cleanroom-compatible engineering plastics; low-contamination transport components for wafer-level and singulated die handling.

  • Test and burn-in components: socket housings, insulator components, and carrier trays specified for electrical insulation, dimensional stability, and thermal performance through repeated high-temperature cycling.

  • Marking, singulation, and finishing fixtures: precision fixtures and tooling components in high-temperature engineering plastics for laser marking, singulation, and post-process operations.

Case Study: F-LON® 7000 Chemical Resistant Coating for Semiconductor PCB Plating

A semiconductor manufacturer needed protection for baskets used in electro gold plating of PCBs. Without coating, gold built up on basket surfaces, disrupting production and increasing waste.

Fluorocarbon applied F-LON® 7000, a high-purity fluoropolymer coating, to all wetted surfaces. Gold build-up was eliminated, the silicone spray dependency removed, and damaged baskets can be recoated rather than replaced, reducing costs and extending equipment life.

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Our engineers can help identify the most suitable materials and manufacturing approach for your semiconductor application. Send us an enquiry!

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